Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
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چکیده
منابع مشابه
Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
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ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
سال: 2011
ISSN: 0734-2101,1520-8559
DOI: 10.1116/1.3554691